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AMAT 0040-45062
Product Name: Chamber Liner with Integrated Gas Channel
Product Description: A precision‑formed chamber liner designed for semiconductor process chambers, featuring built‑in gas channels to deliver process gases evenly while protecting the chamber body from plasma and deposition byproducts.
Technical Specifications:
- Material: High-purity aluminum alloy with ceramic plasma-resistant coating
Detailed content
- Structure: Cylindrical liner with precision-machined circumferential gas distribution channels
- Surface Coating: Yttrium oxide (Y₂O₃) coated for enhanced plasma erosion resistance
- Temperature Rating: Continuous operation up to 600°C
- Dimensional Tolerance: ±0.01 mm for assembly alignment
Functional Features:
- Delivers process gases uniformly to improve wafer-to-wafer consistency
- Acts as a consumable barrier to extend main chamber service life
- Resists corrosion from fluorocarbon and oxygen-based plasma chemistries
- Minimizes particle generation and contamination risk
- Simplifies preventive maintenance with modular replacement design
Application Scenarios: Used in dielectric etch, PECVD, and metal etch chambers on AMAT Centura and Endura platforms.
