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AMAT 0040-42913
Product Name: Precision Machined Ceramic/Metal Component
Product Description: A high-precision structural component designed for semiconductor manufacturing chambers. It is engineered to maintain dimensional stability under extreme thermal cycles and vacuum conditions.
Technical Specifications:
- Material: High-purity aluminum oxide (Al₂O₃) ceramic or anodized aluminum alloy
Detailed content
- Tolerance: ±0.001 inches for critical dimensions
- Surface Finish: Ra ≤ 0.8 μm, polished for low particle generation
- Temperature Resistance: Continuous operation up to 450°C
Functional Features:
- Excellent thermal shock resistance to prevent cracking during rapid heating/cooling
- High chemical inertness, resisting corrosion from process gases (e.g., fluorine, chlorine plasmas)
- Low outgassing rate, suitable for ultra-high vacuum (UHV) environments
- Precision-machined interfaces ensure accurate alignment within the chamber
Application: Used in Etch, Deposition (CVD/PVD), and Pre-Clean chambers for 200mm/300mm wafer platforms, serving as a shield, liner, or mounting plate.
