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AMAT 0040-42746
Product Name: Gas Distribution Plate (Showerhead)
Product Description: A critical component for uniformly distributing process gases across the wafer surface in chemical vapor deposition (CVD) and etch processes.
Technical Specifications:
- Material: High-purity Aluminum, Silicon Carbide (SiC), or coated metal.
Detailed content
- Design: Contains a precise array of hundreds of micro-drilled holes.
- Tolerances: Hole diameter and spacing held to strict tolerances for flow uniformity.
Functional Features:
- Uniform Gas Delivery: Ensures laminar flow and consistent gas concentration over the wafer.
- Process Stability: Minimizes micro-loading effects and improves within-wafer uniformity.
- Thermal Management: Often integrated with heating/cooling channels for temperature control.
- Cleanability: Smooth surfaces and resistant to deposition buildup for easy cleaning.
Application: Core component in CVD (Centura 5200, Producer) and Etch chambers for thin-film growth and wafer patterning.
