Digital guide
You are here:
AMAT 0040-39042
Product Name: Chamber Liner Assembly
Product Description: A precision-machined protective liner installed inside semiconductor processing chambers to shield the main chamber body from plasma, chemical corrosion, and process byproduct accumulation.
Technical Specifications:
- Material: 316L stainless steel with plasma-resistant coating
Detailed content
- Surface Finish: Electropolished for vacuum compatibility
- Leak Rate: <1×10⁻⁹ atm-cc/sec He
- Operating Temperature: -20°C to +200°C
- Dimensional Accuracy: ±0.02 mm
- Compatibility: Designed for standard AMAT chamber profiles
Functional Features:
- Isolates chamber wall from direct plasma contact
- Reduces particle contamination during processing
- Extends overall chamber service life
- Simplifies routine cleaning and replacement
- Maintains consistent plasma environment stability
- Resists etching by fluorine and chlorine chemistries
Application Scenarios:
- Plasma etch chambers
- PVD and CVD processing equipment
- Semiconductor wafer fabrication cleanrooms
- High-density plasma processing systems
- AMAT Centura and Endura platforms
