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AMAT 0040-20518
Brand & Part Number: Applied Materials (AMAT) 0040-20518
Product Name: Deposition Ring / Focus Ring
Product Description: A critical consumable ring that surrounds the wafer pedestal, used to confine plasma and ensure uniform deposition or etching across the wafer surface.
Detailed content
Technical Specifications:
- Material: High-grade silicon carbide (SiC) or doped silicon (Si)
- Dimensions: Designed for 200mm/300mm wafer processing
- Flatness: Total Thickness Variation (TTV) < 5 μm
Functional Features:
- High thermal conductivity for efficient heat dissipation
- Resists erosion and sputtering damage, extending service life
- Precision profile ensures uniform gas flow and plasma distribution
- Minimizes micro-arcing and particle contamination
Application: Primarily deployed in PVD (Physical Vapor Deposition) and Etch chambers, directly influencing process uniformity and yield.
