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AMAT 0040-20100-01
Product Name: 11.3″ TIW Source Magnet Assembly
Product Description: A high-performance permanent magnet assembly designed for the Target Ion Wafer (TIW) PVD source, generating a confined magnetic field for plasma control.
Technical Specifications:
- Material: High-grade neodymium-iron-boron (NdFeB)
Detailed content
- Configuration: Concentric multi-pole ring
- Diameter: 11.3 inches
- Coating: Nickel-copper-nickel (Ni-Cu-Ni)
- Field Strength: Optimized for PVD sputtering
Functional Features:
- Generates uniform magnetic field for high-density plasma confinement.
- High magnetic stability over extended operating periods.
- Corrosion-resistant coating for vacuum compatibility.
- Precision-machined for exact fit in TIW source assemblies.
Application Scenarios: Endura PVD chambers utilizing TIW (Target Ion Wafer) magnetron sputtering sources.
