Digital guide
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Detailed content
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- Internal Coating: High-emissivity ceramic coating
- Vacuum Rating: 1×10⁻¹⁰ Torr ultimate pressure
- Dimensions: 450mm diameter × 300mm height
- Port Configuration: Multiple CF-flange ports for gas, vacuum, and diagnostic access
- Functional Features:
- Provides structural integrity for high-vacuum environment
- Excellent thermal uniformity for precise process control
- Multiple access ports for flexible system configuration
- Precision-machined sealing surfaces for leak-tight performance
- Designed for compatibility with various CVD chemistries
- Application Scenarios:
- Used in AMAT P-5000 and Centura 5200 CVD systems
- Applied in oxide, nitride, and poly-silicon deposition processes
- Deployed in 200mm semiconductor wafer fabrication
- Utilized in both production and R&D environments
- Suitable for low-pressure and plasma-enhanced CVD processes
