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AMAT 0040-09095
Product Name: High-Purity Quartz Gas Distribution Insert
Product Description: A fused silica component designed to uniformly distribute process gases inside semiconductor chambers while maintaining chemical inertness and high purity.
Technical Specifications:
- Material: High-purity synthetic fused quartz (SiO₂), ≥99.99% purity
Detailed content
- Structure: Multi-port insert with precision-drilled flow channels
- Surface Finish: Fire-polished to reduce particle adhesion
- Temperature Resistance: Up to 1100°C
- Vacuum Compatibility: UHV-grade low-outgassing material
Functional Features:
- Ensures laminar gas flow and uniform distribution over the wafer
- Chemically inert to halogen plasmas and oxidizing process gases
- Does not introduce metallic contamination during processing
- Withstands rapid thermal cycling without cracking
- Easy to clean and reinstall during maintenance
Application Scenarios: Used in CVD, ALD, and etch chambers requiring ultra-high purity gas delivery.
