Digital guide
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Technical Specifications:
- Material: 5083 or 6061 aluminum alloy, fully stress-relieved
- Surface Treatment: Electropolished and passivated internal surfaces
- Vacuum Rating: Compatible with high vacuum (10⁻⁷ Torr) and ultra-high vacuum conditions
- Leak Rate: Helium leak tightness < 1 x 10⁻⁹ atm-cc/sec
Functional Features:
- Rigid structure maintains dimensional stability under vacuum and thermal cycling
- Smooth internal surfaces minimize particle entrapment and facilitate easy cleaning
- Precision-machined flanges for secure, leak-tight connections to other chamber modules
- Optimized wall thickness for efficient thermal management
Application: Serves as the main vacuum chamber for deposition (CVD/PVD) and etching processes on Centura and Endura platforms.
