Digital guide
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Technical Specifications:
- Material: 304 stainless steel, plasma-coated
- Coating Thickness: 20 μm protective ceramic layer
- Surface Finish: Electropolished, Ra ≤ 0.5 μm
- Vacuum Compatibility: UHV-rated, leak rate < 1 × 10⁻⁹ atm-cc/sec He
- Operating Temperature: Up to 350°C
- Thickness: 2.0 mm structural material
Functional Features:
- High resistance to plasma sputtering and chemical corrosion
- Smooth non-particulating surface to minimize contamination
- Precision-formed profile for optimal gas flow dynamics
- Structural rigidity to maintain chamber integrity
- Easy installation and alignment during maintenance
- Extended service life in high-stress plasma environments
Application: Installed in Etch and PVD chambers to protect chamber walls and components from process-induced damage.
