Digital guide
You are here:
AMAT 0021-36627
Product Name: Chamber Gas Baffle Shield Assembly
Product Description: A multi‑functional metal shield that redirects and diffuses process gas flow, confines plasma, and protects chamber walls from sputtered deposition in PVD and etch environments.
Technical Specifications:
- Material: High‑purity aluminum with ceramic plasma‑resistant coating
Detailed content
- Structure: Perforated baffle design with integrated mounting tabs
- Coating: Yttria (Y₂O₃) reinforced protective layer
- Temperature Resistance: Up to 600°C
- Dimensional Tolerance: ±0.02mm for proper alignment
Functional Features:
- Promotes uniform gas distribution across the wafer surface
- Reduces direct plasma impact on chamber walls
- Captures particulate and sputtered materials to reduce contamination
- Extends intervals between chamber cleaning cycles
- Simple mounting for rapid replacement
Application Scenarios: Used in PVD chambers, metal etch chambers, and dielectric etch modules.
