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AMAT 0021-29364
Product Name: RF Shield Isolator Ring Assembly
Product Description: A precision-engineered ceramic isolator ring designed to provide electrical isolation for RF shield components in semiconductor plasma processing chambers, ensuring stable plasma generation and containment while maintaining vacuum integrity.
Technical Specifications:
- Material: High-purity alumina ceramic (99.8%)
Detailed content
- Outer Diameter: 220 mm
- Inner Diameter: 180 mm
- Thickness: 20 mm
- Dielectric Constant: 9.8 at 1 MHz
- Volume Resistivity: >10¹⁴ Ω·cm
- Maximum RF Voltage: 18 kV RMS
- Operating Temperature: -30°C to +650°C
- Surface Finish: Polished to Ra <0.25 μm
- Leak Rate: <1×10⁻¹⁰ atm-cc/sec He
Functional Features:
- Excellent RF insulation properties for high-voltage plasma applications
- High thermal stability at elevated process temperatures
- Low dielectric loss for efficient RF power transmission
- Chemical resistance to aggressive plasma environments
- Smooth surface to minimize particle trapping
- Precision manufacturing for perfect chamber fit
- Long service life in harsh semiconductor process conditions
Application Scenarios:
- Semiconductor plasma etching chambers
- PVD/CVD RF shield assemblies
- Plasma-enhanced deposition systems
- RF power delivery components
- Vacuum chamber plasma containment structures
