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AMAT 0021-23836
- Product Name: Ceramic Shield Ring
- Product Description: High-purity ceramic shield ring for plasma confinement and thermal protection in semiconductor process chambers. It shields chamber walls from direct plasma exposure and thermal stress.
- Technical Specifications:
- Material: 99.6% High-purity Alumina (Al₂O₃)
- Dimensions: 300mm Outer Diameter (12″)
Detailed content
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- Thickness: 12mm
- Dielectric Strength: >18 kV/mm
- Max Operating Temperature: 1700°C
- Surface Finish: Ra < 0.8 μm (polished)
- Functional Features:
- Excellent plasma erosion resistance
- Non-contaminating, low-particulate surface
- High thermal shock resistance
- Electrical insulation for RF environments
- Precision-machined for exact chamber fit
- Resistant to chemical corrosion from process gases
- Applications: Upper/lower chamber shields in PVD and Etch chambers; thermal and plasma barrier for 300mm wafer processing platforms.
