Digital guide
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Technical Specifications:
- Material: Silicon carbide (SiC) or high-purity aluminum oxide (Al₂O₃)
- Outer Diameter: 450 mm (for 300mm chambers)
- Surface: Coated or treated for high plasma resistance
- Temperature Resistance: Up to 600°C
Functional Features:
- Extremely high resistance to plasma sputtering and chemical attack
- Low particle generation to maintain wafer cleanliness
- Precision-machined lip for secure seating
- Optimized geometry to improve plasma confinement
Application: Used in PVD chambers (Endura platforms) as a consumable shield to protect the main chamber body.
