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AMAT 0021-16858
Product Name: Quartz Shield Assembly
Product Description: A high-purity quartz protective component used to shield internal chamber parts from plasma exposure while maintaining optical transparency for process monitoring.
Technical Specifications:
- Material: High-purity synthetic fused silica
Detailed content
- Temperature Resistance: Up to 1200°C
- Hydroxyl Content: Ultra-low to prevent contamination
- Surface Quality: Polished, free of bubbles and inclusions
- Dimensional Accuracy: ±0.03 mm
- Chemical Resistance: Inert to most process chemistries
Functional Features:
- Excellent thermal shock resistance
- High optical transmission for process detection
- Non-porous surface to avoid particle trapping
- Resistance to fluorine and chlorine plasma etching
- Low metallic impurity content
- Easy cleaning and regeneration
Application Scenarios:
- Plasma etch chamber shielding
- PECVD and ALD process protection
- Optical emission spectroscopy (OES) windows
- Wafer processing chamber liners
- Advanced semiconductor manufacturing chambers
