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AMAT 0021-14344
Product Name: Chamber Shield / Focus Ring Assembly
Product Description: A consumable metallic or ceramic shield that focuses the plasma onto the wafer and protects the chamber walls from excessive deposition or sputtering.
Technical Specifications:
- Material: High-purity Aluminum, Copper, or Stainless Steel (depending on process).
Detailed content
- Form: Cylindrical or conical sleeve with precision-machined profiles.
- Coating: Often coated with anti-sputter materials (e.g., TiN, Y₂O₃).
Functional Features:
- Plasma Focusing: Shapes the plasma density for optimal process performance.
- Contamination Control: Captures sputtered material, preventing it from depositing on chamber components.
- Extended Chamber Life: Reduces cleanroom maintenance frequency by protecting main chamber parts.
- Compatibility: Designed for specific plasma chemistries (e.g., Cu, Al, Ti).
Application: Used in PVD chambers (Endura) for metal deposition and dielectric etch processes.
