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AMAT 0021-13217
Product Name: Plasma‑Resistant Chamber Shield Assembly
Product Description: A consumable shield assembly that lines the inner chamber wall to capture sputtered materials, confine plasma, and protect the main chamber body from damage.
Technical Specifications:
- Material: High-purity aluminum with anodized or ceramic coating
Detailed content
- Form: Cylindrical shield with precision mounting features
- Coating Thickness: Uniform plasma-resistant protective layer
- Temperature Rating: Up to 550°C
- Fitment: Direct replacement for standard chamber liners
Functional Features:
- Absorbs sputtered particles to reduce chamber contamination
- Shapes plasma density for improved process uniformity
- Extends interval between chamber deep cleaning cycles
- Minimizes particle emission during processing
- Allows quick replacement to reduce tool downtime
Application Scenarios: Used in PVD, metal etch, and dielectric etch chambers.
