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AMAT 0020-96815
Product Name: Lower Chamber Shield / Deposition Baffle
Product Description: A one-piece, cylindrical aluminum shield installed in the lower chamber section. It protects the chamber base and pump port from coating buildup and optimizes gas flow dynamics.
Technical Specifications:
- Material: High-purity 6061-T6 aluminum
Detailed content
- Surface: Electropolished + anti-spatter coating
- Wall Thickness: 5mm (uniform)
- Features: Precision pump-out slots & alignment notches
- Dimensional Tolerance: ±0.1mm
- Weight: Lightweight design (2.8 kg)
- Cleanliness: UHP cleaned & packaged
Key Features:
- Extends preventive maintenance (PM) intervals
- Reduces particle contamination from flaking deposits
- Optimizes pumping conductance for stable pressure control
- Resists corrosion from etch byproducts
- Direct fit for quick replacement
Application Scenarios:
Installed in AMAT Producer & Centura PECVD & ALD chambers. Used for dielectric, barrier, and metal film deposition processes.
