Digital guide
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AMAT 0020-85925
Product Name: Process Chamber Shield & Liner Assembly
Product Description: A consumable shield and liner component installed inside the vacuum process chamber, used to protect the chamber body from plasma bombardment and chemical corrosion, collect process byproducts, optimize gas flow and plasma distribution, and maintain process stability and chamber cleanliness.
Technical Specifications:
- Material: High‑purity anodized aluminum, 316L stainless steel, silicon carbide or ceramic composite
Detailed content
- Surface Coating: Optional anti‑corrosion and anti‑sputtering coating
- Structure: Integrated molding or segmented assembly design
- Thickness: Designed according to erosion rate to ensure service life
- Vacuum Compatibility: UHV compatible, no pollution and low outgassing
- Installation: Standard positioning structure for quick replacement
Key Features:
- Effectively absorbs sputtering particles and reduces chamber contamination
- Optimizes gas flow field and plasma distribution to improve process uniformity
- Extends the service life of the main chamber and reduces maintenance frequency
- Low particle emission, reducing wafer defect rate
- Easy to disassemble and clean, suitable for preventive maintenance cycle
Application Scenarios:
Widely used in PVD chambers, metal etching chambers, dielectric etching chambers and CVD chambers to isolate process plasma, protect vacuum cavity and stabilize process parameters.
