Digital guide
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AMAT 0020-76182
- Product Name: High-Purity Gas Distribution Plate
- Product Description: A precision-machined stainless steel plate designed for uniform distribution of ultra-high purity (UHP) process gases within semiconductor deposition chambers.
- Technical Specifications:
- Material: 316L VIM-VAR stainless steel, electropolished interior (Ra < 0.5 μm).
Detailed content
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- Dimensions: 300mm diameter, 12mm thickness.
- Hole Configuration: 127 precision-drilled, laser-cut orifices (0.8mm diameter) in a concentric pattern.
- Connections: 4x 1/4″ VCR male inlet ports.
- Functional Features:
- Ensures laminar gas flow and uniform wafer-to-wafer process consistency.
- Minimizes dead volume and particle entrapment.
- Resists corrosion from halogenated and corrosive process gases.
- Facilitates rapid purge cycles to reduce cross-contamination.
- Application Scenarios: Used in dielectric etch, PECVD, and ALD chambers on Centura and Producer platforms for processes like TEOS, SiN, and low-k dielectric deposition.
