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AMAT 0020-76062 Wafer Pedestal Heater Assembly
Product Description: A precision-engineered resistive heater assembly integrated into 200mm wafer pedestals, providing uniform, stable thermal control for semiconductor deposition and etching processes. It ensures consistent wafer temperature across the entire substrate surface.
Technical Specifications:
- Heater Type: Dual-zone resistive heating element
- Power Rating: 1200W total (600W per zone)
- Voltage: 240V AC
Detailed content
- Temperature Range: 20°C to 400°C
- Temperature Uniformity: ±1.0°C across 200mm wafer
- Control Accuracy: ±0.5°C setpoint
- Material: Inconel 600 heating element + 316L stainless steel housing
- Dimensions: 250mm diameter × 50mm height
- Weight: 3.2 kg
- Compliance: SEMI S2, CE
Functional Features:
- Dual-zone independent temperature control for edge-to-center uniformity
- Fast heat-up and cool-down response for process efficiency
- Embedded RTD sensors for real-time temperature monitoring
- Low outgassing design for UHV compatibility
- Corrosion-resistant construction for harsh process environments
- Precision machining for perfect fit with AMAT 200mm pedestals
- Long service life with minimal maintenance requirements
Application Scenarios:
- PVD chambers for metal deposition processes
- CVD chambers for dielectric film growth
- Etch chambers for thermal-assisted etching
- Annealing chambers for controlled wafer heating
- Pre-clean chambers for wafer surface preparation
