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AMAT 0020-70459
Product Name: Quartz Gas Distribution Plate
Product Description: A precision-fabricated quartz plate featuring a matrix of micro-drilled holes for uniform distribution of process gases across a wafer surface in semiconductor deposition chambers.
Technical Specifications:
- Material: High-purity synthetic fused silica (quartz)
Detailed content
- Purity: Ultra-low metallic impurities (<1ppb)
- Hole Configuration: Multi-zone pattern of precision-drilled orifices
- Dimensional Tolerance: ±0.05mm for flatness and hole positioning
- Thermal Shock Resistance: Excellent stability under rapid thermal cycling
Functional Features:
- Ensures laminar, uniform gas flow for consistent layer deposition.
- Chemically inert to all semiconductor process gases (corrosive & inert).
- Smooth, polished surfaces prevent particle nucleation and accumulation.
- Transparent to infrared (IR) for efficient radiant heating through the plate.
Application Scenarios: Centura and Producer series PECVD, ALD, and thermal CVD chambers.
