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AMAT 0020-57650
Product Name: Upper Chamber Shield / Focus Ring Assembly
Product Description: A high-purity, machined aluminum shield component that lines the upper region of the process chamber. It protects the chamber walls from plasma bombardment, controls plasma distribution, and minimizes deposition of process byproducts.
Technical Specifications:
- Material: High-purity 6061-T6 aluminum alloy
Detailed content
- Surface Treatment: Hard anodized (50μm thickness) for plasma resistance
- Dimensional Tolerance: ±0.05mm for critical alignment features
- Flatness: < 10μm across sealing surfaces
- Cleanliness: Class 10 cleanroom assembled & packaged
- Compatibility: 200mm wafer process chambers
Key Features:
- Optimized geometry confines plasma to process zone
- High emissivity coating improves thermal uniformity
- Resists corrosion from fluorine and chlorine-based plasmas
- Low particle generation reduces wafer defect rates
- Direct drop-in replacement for OEM components
Application Scenarios:
Deployed in AMAT Centura Etch chambers (dielectric etch, metal etch) and PVD chambers. Critical for processes requiring tight plasma control, such as contact etch and metal line etching.
