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AMAT 0020-48304
Product Name: Process Shield / Chamber Liner Assembly
Product Description: A consumable protective liner installed within the process chamber to shield the chamber wall from plasma bombardment, chemical corrosion, and deposition of process byproducts. It optimizes gas flow and extends chamber maintenance intervals.
Technical Specifications:
- Material: High-purity, plasma-sprayed coated aluminum or SiC composite
Detailed content
- Thickness: 3–5mm (process-dependent for optimal life)
- Form: Segmented or one-piece cylindrical design
- Surface: Coated with anti-spatter, high-emissivity coating
- Mounting: Tool-less, drop-in design with precision locating tabs
- Cleanliness: UHP clean, double-bagged in Class 10 cleanroom
Key Features:
- Effectively absorbs energetic plasma ions and protects chamber walls
- Minimizes particle generation and contamination risk
- Optimizes gas flow dynamics for improved process uniformity
- Easy to install and replace, reducing maintenance downtime
- Consistently reproduces process conditions across replacement cycles
Application Scenarios:
Used in AMAT Producer, Centura, and Endura etch and deposition chambers. Primary application is in dielectric etch, metal etch, and PVD chambers where high levels of sputtering occur.
