Digital guide
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AMAT 0020-40683
Product Name: Gas Distribution / Showerhead Insert Component
Product Description: A precision-engineered insert for gas showerhead assemblies that ensures uniform distribution of process gases across the wafer surface. It plays a critical role in achieving thin film uniformity and process consistency.
Technical Specifications:
- Material: High-purity aluminum or anodized aluminum alloy
Detailed content
- Design: Multi-hole, precision-drilled gas distribution matrix
- Hole Diameter: Precision-machined orifices (0.5–1.0mm, process-specific)
- Surface Coating: Plasma-resistant, non-stick anodized coating
- Flatness: < 5 μm across entire surface
- Mounting: Drop-in design with centering locator pins
- Cleanliness: Class 1 cleanroom assembled & packaged
Key Features:
- Ensures laminar gas flow and uniform distribution over wafer
- Minimizes process gas recirculation and edge effects
- Resists coating buildup and easy to clean
- Precision orifice sizing guarantees consistent gas flow dynamics
- Direct replacement for OEM components with guaranteed fit
Application Scenarios:
Used in AMAT PECVD, ALD, and epitaxial deposition chambers. Critical for processes requiring exceptional film thickness uniformity, such as gate oxide, interlayer dielectric, and capacitor film deposition.
