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AMAT 0020-38890
Product Name: DPS Cathode Chamber Cover
Product Description: A heavy-duty, precision-machined aluminum cover that forms the top closure of the DPS (Dielectric Plasma Etch) chamber. It provides a vacuum-tight seal, houses the upper electrode feedthrough, and supports the showerhead assembly.
Technical Specifications:
- Material: Forged 6061-T6 aluminum alloy
Detailed content
- Surface Finish: Internal electropolished (Ra < 0.8μm), external chemical film
- Dimensions: 450mm diameter x 75mm thick
- Port Configuration: Central 100mm CF feedthrough port, 8 auxiliary ports
- Vacuum Rating: UHV compatible, leak rate < 5 x 10⁻¹⁰ mbar·l/s
- Flatness: < 10μm across the chamber sealing face
- Bakeable: Up to 150°C
Key Features:
- Rigid one-piece construction maintains vacuum integrity
- Precision port alignment ensures accurate electrode centering
- Low outgassing for rapid pump-down and stable UHV
- Corrosion-resistant to fluorine-based etch plasmas
- Integrated cooling channels for thermal stability
Application Scenarios:
Serves as the main top cover for AMAT Centura DPS II etch chambers. Used in high-volume dielectric etch processes for 200mm/300mm wafer manufacturing.
