Digital guide
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AMAT 0020-38690
- Brand & Part Number: Applied Materials (AMAT) 0020-38690
- Product Name: Quartz Focus Ring
- Product Description: A high-purity synthetic quartz focus ring for semiconductor process chambers. It is designed to focus and confine plasma, improve process uniformity, and protect chamber components from energetic ion bombardment.
Detailed content
- Technical Specifications:
- Material: High-purity synthetic amorphous silica (SiO₂ ≥ 99.99%)
- Internal/External Diameter: Custom for 200mm/300mm wafer processes
- Thickness: 6.0 ~ 12.0 mm
- Optical Transmittance: > 80% at 193 ~ 2,000 nm
- Maximum Operating Temperature: 1,100°C
- Metal Impurity: < 1 ppm (total trace metals)
- Functional Features:
- Excellent plasma resistance and low etch rate
- Ultra-high purity prevents wafer contamination
- High transmittance for UV/IR process monitoring
- Precision-machined profile optimizes plasma focusing
- Excellent thermal shock resistance
- Applications:
- Plasma focus rings in AMAT etch and deposition chambers
- 200mm/300mm wafer process uniformity enhancement
- High-density plasma processes (ICP, ECR, HDP)
