Digital guide
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AMAT 0020-34694
Product Name: GDP Oxide Process Chamber Liner
Product Description: A high-purity quartz chamber liner engineered for Gas Distribution Plate (GDP) oxide deposition processes, providing a chemically inert, non-contaminating surface that maintains process purity and uniform gas flow.
Technical Specifications:
- Material: High-purity UV-grade fused quartz
Detailed content
- Structure: Cylindrical liner with precision gas flow ports
- Surface Finish: Fire-polished internal surface, Ra ≤0.2μm
- Temperature Resistance: Up to 1050°C
- Dimensional Precision: Tight tolerance for GDP alignment
- Material Purity: ≥99.999% SiO₂, metallic impurities <1ppb
Functional Features:
- Chemically inert to oxide deposition precursors and byproducts
- Precision gas ports ensure uniform radial gas distribution
- Non-porous surface prevents particle entrapment and contamination
- Transparent to process monitoring wavelengths
- Low particulate generation during thermal cycling
Application Scenarios: Deployed in R2 Oxide GDP chambers for PECVD processes, specifically for interlayer dielectric (ILD) and pre-metal dielectric (PMD) oxide deposition.
