Digital guide
You are here:
AMAT 0020-34335
Product Name: Ceramic Chamber Liner Insert
Product Description: High-purity alumina ceramic insert designed to line inner chamber walls, protecting structural components from plasma damage and minimizing cross-contamination during wafer processing.
Technical Specifications:
- Material: 99.6% high-purity alumina ceramic (Al₂O₃)
Detailed content
- Dielectric Strength: Exceeds 17kV/mm
- Operating Temperature: Up to 1600°C in vacuum environments
- Dimensional Tolerance: ±0.02mm for critical mating surfaces
- Coating: Uncoated dense sintered structure
Functional Features:
- Provides excellent electrical isolation for RF and high-voltage components
- Resists chemical attack from halogen-based etch gases
- Reduces particle generation and deposition on chamber walls
- Easy to install and replace during preventive maintenance cycles
Application Scenarios: Etch chambers, PVD chambers, and plasma treatment modules requiring high-purity non-metallic shielding.
