Digital guide
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Detailed content
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- Load Capacity: 50kg dynamic load rating
- Surface Finish: Passivated for corrosion resistance
- Precision: Machined to ±0.01mm dimensional tolerances
- Functional Features:
- Provides rigid support for vertical lift mechanisms
- Ensures precise alignment during pedestal movement
- High fatigue resistance for millions of lift cycles
- Compatible with high vacuum and process chemistries
- Designed for minimal particle generation during operation
- Application Scenarios:
- Used in AMAT Centura etch chambers
- Applied in electrostatic chuck (ESC) pedestal lift systems
- Deployed in wafer transfer and positioning subsystems
- Utilized in both dielectric and metal etch applications
- Suitable for 200mm and 300mm wafer processing platforms
