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AMAT 0020-30917 Precision Ceramic Lift Pin Assembly
Product Overview: The AMAT 0020-30917 is a high-precision ceramic lift pin assembly engineered for Applied Materials semiconductor processing equipment. It is designed to safely lift, support, and position wafers within process chambers, load locks, and wafer handling systems, ensuring zero-contact, scratch-free handling of delicate semiconductor wafers. Manufactured from ultra-high-purity ceramic materials, this assembly delivers exceptional mechanical stability, thermal resistance, and plasma compatibility, making it a critical component for maintaining wafer integrity and process uniformity in advanced semiconductor manufacturing.
Technical Specifications:
Technical Specifications:
- Material: 99.99% high-purity alumina (Al₂O₃) ceramic, offering extreme hardness (9 Mohs) and thermal stability.
- Dimensions: Length 60mm, diameter 3.2mm, with a precision-machined rounded tip (radius 1.2mm) to prevent wafer damage.
Detailed content
- Surface Finish: Electropolished internal/external surfaces with Ra ≤ 0.08μm, minimizing particle generation and wafer adhesion.
- Temperature Resistance: Continuous operating temperature up to 1300°C, short-term peak up to 1500°C.
- Dimensional Tolerance: ±0.003mm for length and diameter, ensuring consistent wafer alignment.
- Plasma Compatibility: Resistant to erosion from CF₄, Cl₂, Ar, and other reactive process gases.
- Load Capacity: Static load capacity of 2.5kg, supporting standard 200mm/300mm wafers without deformation.
- Certification: Complies with SEMI F17 ceramic component standards and ISO 9001 quality requirements.
Functional Features:
- Provides non-contact wafer lifting and positioning, eliminating scratches, contamination, and wafer breakage.
- Maintains dimensional stability under extreme thermal cycling, ensuring consistent performance over 10,000+ lift cycles.
- Resists plasma and chemical corrosion, extending service life and reducing maintenance frequency.
- Minimizes particle outgassing, critical for maintaining Class 1 cleanroom environments.
- Integrates seamlessly with AMAT’s chamber lift mechanisms and robotic wafer handling systems.
- Features a lightweight design that does not impede chamber vacuum pumping or gas flow dynamics.
Application Scenarios:
- Installed in AMAT Centura, Endura, and Producer series process chambers for etching, CVD, and PVD processes.
- Used in 200mm and 300mm wafer manufacturing lines for logic chips, DRAM/NAND memory, and power semiconductors.
- Applied in load locks and wafer transfer modules for safe wafer movement between equipment stations.
- Ideal for high-volume production fabs requiring zero-defect wafer handling and maximum equipment uptime.
- Deployed in R&D facilities for advanced semiconductor process development and wafer testing.
