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AMAT 0020-30420

Product Name: Electrostatic Chuck Ring Assembly

Product Description: A precision support ring designed to surround and stabilize wafers on electrostatic chucks during high-vacuum semiconductor processing. It ensures edge uniformity and prevents thermal or process irregularities at wafer peripheries.

Technical Specifications:

  • Material: High-purity ceramic or aluminum alloy

Detailed content

  • Surface Treatment: Electropolished or passivated finish
  • Dimensional Tolerance: ±0.01 mm
  • Thermal Conductivity: Optimized for uniform heat distribution
  • Compatibility: 200mm and 300mm wafer processing systems
  • Hardness: High structural rigidity to prevent deformation

    Functional Features:

  • Precise wafer centering and edge protection
  • Uniform thermal distribution across wafer surface
  • Minimized edge effects during deposition and etching
  • Low outgassing for ultra-high vacuum compatibility
  • High resistance to plasma and chemical corrosion
  • Easy installation and replacement during PM cycles

    Application Scenarios:

  • Electrostatic chuck (ESC) systems
  • Plasma etching and deposition processes
  • Wafer thermal processing equipment
  • Semiconductor device manufacturing
  • Advanced node wafer production lines

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