Digital guide
You are here:
AMAT 0020-30085
- Brand & Part Number: Applied Materials (AMAT) 0020-30085
- Product Name: Silicon Carbide (SiC) Focus Ring
- Product Description: A high-performance silicon carbide focus ring for plasma confinement in semiconductor etch chambers. It delivers exceptional wear resistance, thermal conductivity, and plasma stability for advanced etching processes.
Detailed content
- Technical Specifications:
- Material: Sintered alpha-phase silicon carbide (SiC)
- Hardness: ≥ 2800 HV (Vickers)
- Thermal Conductivity: ≥ 130 W/m·K
- Maximum Operating Temperature: 1600°C
- Density: ≥ 3.16 g/cm³
- Surface Finish: Precision ground (Ra ≤ 0.8μm)
- Porosity: < 0.1% closed porosity
- Functional Features:
- Extreme resistance to plasma erosion and chemical corrosion
- Superior thermal conductivity dissipates process heat efficiently
- High dimensional stability maintains process uniformity
- Non-contaminating ultra-high purity composition
- Excellent thermal shock resistance during rapid process cycling
- Extended service life reduces maintenance frequency
- Applications:
- Focus/confinement rings in dielectric and poly etch chambers
- High-density plasma etch processes
- AMAT Centura etch platforms (MXP+ etch systems)
- Advanced node semiconductor manufacturing (≤ 45nm)
