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AMAT 0020-26823
Product Name: 6″ HTHU Deposition Low Knee Shield
Product Description: A precision-machined annular shield component designed for 6-inch (150mm) wafer process chambers, specifically for HTHU (High Throughput Uniformity) deposition processes. It confines plasma, protects chamber components, and ensures uniform thin-film growth.
Technical Specifications:
- Wafer Compatibility: 6-inch (150mm) wafer systems.
Detailed content
- Material: High-purity, bead-blasted aluminum alloy for plasma resistance.
- Form: Precision-machined ring with contoured “low knee” profile.
- Surface Finish: Non-reflective, plasma-sprayed coating to minimize particle generation.
- Fit: Direct replacement for HTHU series deposition chambers.
Functional Features:
- Optimized geometry to direct plasma and process gases uniformly toward the wafer.
- Shields upper chamber components from unwanted thin-film deposition.
- High structural rigidity to maintain dimensional stability under thermal cycling.
- Low outgassing properties suitable for ultra-high vacuum (UHV) environments.
- Easy to install and replace as a consumable part.
Application Scenarios:
- Deployed in AMAT Centura HTHU PVD/CVD chambers for 150mm wafer processing.
- Used in dielectric and metal thin-film deposition processes requiring high uniformity
