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AMAT 0020-26101
Product Name: Quartz Gas Distribution Nozzle
Product Description: High-purity fused silica nozzle for precise gas delivery in semiconductor thin-film deposition processes.
Technical Specifications:
- Material: High-purity synthetic fused silica (quartz)
- Purity: ≥99.998% SiO₂
Detailed content
- Precision-drilled micro-orifice array
- Low metal ion contamination profile
- Temperature resistance: Up to 1100°C
- Tight tolerance machining for uniform flow
Functional Features:
- Ensures uniform gas distribution across wafer surface
- Exceptional purity to prevent process contamination
- Excellent chemical resistance to process gases
- High thermal stability for consistent performance
- Smooth internal surfaces minimize turbulence
Application Scenarios:
- Precision gas delivery in CVD chambers
- Uniform precursor distribution in ALD processes
- High-purity gas injection in oxide/nitride deposition
- Producer and Centura series thin-film systems
