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AMAT 0020-24100
Product Description: A precision-engineered ceramic insulator assembly with integrated antenna, specifically designed for semiconductor plasma processing applications. It provides electrical isolation while enabling efficient RF energy coupling into process chambers.
Technical Specifications:
- Material: High-purity alumina ceramic (99.8%)
Detailed content
- Diameter: 8 inches (203.2mm)
- Dielectric Strength: >25kV/mm
- RF Frequency Compatibility: 13.56MHz standard
- Temperature Resistance: Up to 1200°C
- Surface Finish: Ra <0.8μm
- Coating: Titanium (Ti) coating for enhanced plasma resistance
Functional Features:
- Excellent electrical insulation properties in high-temperature plasma environments
- Optimized antenna design for uniform RF distribution
- High resistance to plasma erosion and chemical corrosion
- Precise dimensional tolerances for perfect chamber fit
- Low particle generation during operation
Application Scenarios:
- Plasma-enhanced chemical vapor deposition (PECVD) systems
- Etch chambers for semiconductor manufacturing
- Solar cell production equipment
- Flat panel display processing
- Vacuum coating applications
