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AMAT 0020-22479
Product Name: Plasma Chamber Shield Assembly
Product Description: A consumable metal shield assembly installed inside process chambers to capture sputtered particles, confine plasma and protect the main chamber body from direct plasma erosion and deposition accumulation.
Technical Specifications:
- Material: High-purity aluminum or titanium alloy with anti-sputtering coating
Detailed content
- Surface Treatment: Anodized or ceramic-coated for enhanced plasma resistance
- Structural Form: Cylindrical shield with precise positioning notches
- Temperature Resistance: Up to 600℃ under plasma working conditions
Functional Features:
- Effectively collects sputtered materials to reduce chamber contamination
- Shapes plasma distribution to improve process uniformity
- Extends chamber service life and reduces maintenance frequency
- Low particle generation to meet advanced process cleanliness requirements
- Quick-release design for fast replacement during preventive maintenance
Application Scenarios: Applied in PVD sputtering chambers, metal etching chambers and dielectric deposition chambers in AMAT semiconductor production platforms.
