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AMAT 0020-10764
- Brand & Part Number: Applied Materials (AMAT) 0020-10764
- Product Name: TEOS Process Chamber Pumping Plate
- Product Description: A precision-machined pumping plate (or baffle plate) designed specifically for TEOS (Tetraethyl Orthosilicate) oxide deposition processes. It optimizes vacuum pumping efficiency and ensures uniform gas distribution within the process chamber.
Detailed content
- Technical Specifications:
- Material: High-purity aluminum alloy (anodized)
- Compatibility: Designed for 4″, 5″, and 6″ wafer process chambers
- Design: Perforated plate with precision-drilled flow channels
- Surface Finish: Smooth, non-particulating anodized coating
- Fit: Direct replacement for OEM Group 219-01202R
- Functional Features:
- Optimizes pumping conductance for uniform chamber pressure
- Promotes uniform gas flow distribution across wafer surface
- Reduces process byproduct accumulation on chamber components
- Minimizes micro-turbulence for enhanced deposition uniformity
- Easy installation and replacement during chamber maintenance
- Applications:
- TEOS oxide deposition processes in AMAT Centura 5200 systems
- PECVD chambers using TEOS precursor for SiO₂ film deposition
- 4–6 inch wafer semiconductor manufacturing platforms
