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AMAT 0020-10527
Product Name: Quartz Chamber Liner
Product Description: A high-purity fused quartz cylindrical liner that lines the interior of semiconductor process chambers, protecting chamber walls from plasma damage and preventing metallic contamination.
Technical Specifications:
- Material: Synthetic fused silica (SiO₂, >99.999% purity)
Detailed content
- Diameter: 280mm
- Height: 220mm
- Wall Thickness: 6mm
- Surface Finish: Fire-polished (Ra < 0.5μm)
- Maximum Operating Temperature: 1100°C
- Thermal Expansion Coefficient: 5.5 × 10⁻⁷ /°C
- Vacuum Compatibility: 10⁻⁸ Torr
Functional Features:
- Exceptional chemical resistance to plasma etchants (F, Cl, O)
- Non-contaminating, ultra-low outgassing for UHV environments
- High thermal shock resistance during rapid thermal cycling
- Non-porous surface prevents particle entrapment
- Precision-machined for exact chamber fit
Application Scenarios: Lining PECVD and Etch chambers in AMAT P5000 and Centura systems for dielectric and metal etch processes.
