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AMAT 0020-09636 Product Name: Quartz Isolator Sleeve

Product Overview: The AMAT 0020-09636 is a high-purity quartz isolator sleeve designed for electrical insulation and thermal protection in Applied Materials semiconductor equipment. It insulates high-voltage components (electrodes, RF feedthroughs, sensor wiring) from chamber bodies and other conductive parts, preventing electrical arcing and ensuring safe operation in high-temperature, high-vacuum environments. Quartz’s exceptional electrical insulation, thermal stability, and plasma transparency make this sleeve ideal for plasma processing applications.

Technical Specifications:

  • Material: High-purity fused quartz (SiO₂), purity ≥ 99.999%, with zero metallic impurities.

Detailed content

  • Dimensions: Outer diameter 25mm, inner diameter 15mm, length 60mm, with precision-ground ends.
  • Electrical Insulation: Volume resistivity ≥ 1×10¹⁶ Ω·cm at 25°C, dielectric strength ≥ 20 kV/mm.
  • Temperature Resistance: Continuous operating temperature up to 1100°C, short-term peak up to 1300°C.
  • Thermal Expansion: Coefficient of 0.5×10⁻⁶/°C, matching silicon wafer and ceramic components.
  • Plasma Transparency: Transparent to RF and microwave plasma, ensuring unimpeded energy transfer.
  • Dimensional Tolerance: ±0.005mm for inner/outer diameters, ensuring precise fit.
  • Certification: Complies with SEMI S2/S8 safety standards and quartz material specifications.

    Functional Features:

  • Provides superior electrical insulation for high-voltage components, preventing arcing and equipment damage.
  • Acts as a thermal barrier, protecting sensitive components from extreme chamber temperatures.
  • Transparent to plasma energy, ensuring efficient power delivery to process chambers.
  • Resists chemical attack and plasma erosion, extending service life.
  • Minimizes particle generation, with a smooth, non-porous surface.
  • Easy to install and replace, reducing maintenance downtime.

    Application Scenarios:

  • Installed in AMAT plasma etch, CVD, and PVD chambers for electrode and RF feedthrough insulation.
  • Used in high-voltage sensor assemblies and electrical feedthroughs.
  • Applied in 200mm and 300mm wafer processing equipment for logic and memory manufacturing.
  • Ideal for processes requiring high-temperature stability and plasma transparency.
  • Deployed in fabs with strict electrical safety and contamination control requirements.

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