Digital guide
You are here:
AMAT 0020-08159
Product Name: Quartz Gas Distribution Nozzle
Product Description: High-purity fused quartz nozzle used for directional delivery of process gases in semiconductor deposition and etching chambers, ensuring uniform gas flow toward the wafer surface.
Technical Specifications:
- Material: High-purity synthetic fused silica
Detailed content
- Purity: Ultra-low metallic impurity content at ppb level
- Structure: Single-piece precision-molded body with fixed orifice
- Thermal Stability: Withstands rapid temperature fluctuations up to 1200°C
- Surface Finish: Polished interior and exterior to reduce particle adhesion
Functional Features:
- Chemically inert to corrosive process gases including fluorocarbons and oxygen plasma
- Minimizes flow turbulence for consistent process results
- Low outgassing rate supports stable ultra-high vacuum conditions
- Resists plasma erosion for extended service life
Application Scenarios: Gas injection systems in PECVD, RIE etching, and ALD process chambers for 200mm and 300mm wafer platforms.
