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AMAT 0020-05871
- Brand & Part Number: Applied Materials (AMAT) 0020-05871
- Product Name: Quartz Gas Distribution Plate
- Product Description: A high-purity quartz plate engineered for uniform gas distribution in semiconductor process chambers. It features precision-drilled holes to ensure laminar gas flow across the wafer surface, enhancing process uniformity during deposition.
Detailed content
- Technical Specifications:
- Material: High-purity synthetic fused silica (SiO₂ ≥ 99.999%)
- Dimensions: 280mm diameter × 6mm thickness
- Hole Pattern: 300+ precision-drilled 0.8mm diameter holes
- Surface Finish: Fire-polished (Ra ≤ 0.5μm)
- Maximum Operating Temperature: 1100°C
- Thermal Expansion Coefficient: 5.5×10⁻⁷/°C
- Trace Metal Content: < 1ppb
- Functional Features:
- Ultra-high purity prevents contamination of sensitive wafer processes
- Optimized hole geometry ensures uniform gas distribution
- Excellent chemical resistance to all semiconductor process gases
- Low thermal expansion maintains dimensional stability at high temperatures
- Non-porous surface minimizes particle entrapment
- Transparent to infrared for process monitoring and thermal profiling
- Applications:
- Gas distribution in PECVD and LPCVD chambers
- TEOS oxide and silicon nitride deposition processes
- AMAT Centura WxZ/CxZ deposition platforms
- Processes requiring uniform precursor gas delivery
