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AMAT 0020-04362
Product Name: Quartz Gas Distribution Plate
Product Description: A high-purity fused quartz plate with precision-drilled holes for uniform distribution of process gases across the wafer surface in PECVD chambers.
Technical Specifications:
- Material: Synthetic fused silica (SiO₂, >99.999% purity)
Detailed content
- Diameter: 300 mm
- Thickness: 12 mm
- Hole Pattern: 144 × 0.8 mm diameter holes (uniform array)
- Surface Finish: Fire-polished (Ra <0.5 μm)
- Flatness: ≤0.04 mm
- Maximum Operating Temperature: 1100°C
- Thermal Expansion: 5.5×10⁻⁷ /°C
- Vacuum Compatibility: 10⁻⁸ Torr
Functional Features:
- Ultra-high purity to eliminate metallic contamination
- Uniform gas distribution for consistent film deposition
- Excellent chemical resistance to all process gases and plasmas
- High thermal shock resistance during rapid thermal cycling
- Non-porous surface prevents particle entrapment
Application Scenarios: Gas distribution in 300mm PECVD chambers (Producer SE, Centura) for TEOS, PSG, BPSG, and SiNx thin-film deposition.
