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AMAT 0020-03398

  • Product Name: Ceramic Chamber Shield
  • Product Description: High-purity alumina ceramic shield for protecting chamber walls from plasma exposure in reactive ion etching processes.
  • Technical Specifications:
    • Material: 99.6% high-purity alumina (Al₂O₃)

Detailed content

    • Dimensions: 240mm OD × 220mm ID × 80mm height
    • Dielectric Strength: >18 kV/mm
    • Max Temperature: 1700°C
    • Surface Finish: Ra < 0.8μm
    • Weight: 1.8 kg
  • Functional Features:
    • Excellent plasma erosion resistance
    • Low particle generation
    • High electrical insulation
    • Chemical inertness to fluorine/chlorine plasmas
    • Precision-machined for exact fit
    • Easy installation and removal
  • Applications: Plasma confinement and chamber protection in 200mm dielectric etch chambers.

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