Digital guide
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Detailed content
- Length: 150mm (standard)
- Diameter: 6mm ceramic pin tip
- Stroke: 50mm vertical travel
- Surface Finish: Electropolished (Ra ≤ 0.8μm)
- Compatibility: 200mm wafer process chambers
Functional Features:
- Smooth, precise vertical positioning of wafers during process cycles
- Non-contaminating ceramic material prevents wafer surface damage
- High-temperature resistance up to 450°C for thermal process compatibility
- Low particle generation design for ultra-clean process environments
- Wear-resistant construction for extended service life
Application Scenarios:
- Wafer positioning in P5000/Centura CVD chambers
- Elevation control in oxide/nitride deposition processes
- Semiconductor process chambers requiring vertical wafer manipulation
- High-temperature thermal processing equipment
