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AMAT 0010-47882
Product Name: Multi‑Zone Heater Pedestal & Wafer Support Assembly
Product Description: An integrated wafer support heater assembly with multi‑zone independent temperature control, used to provide precise and uniform thermal environment for wafers in thin film deposition and etching processes. It integrates heating, support and RF bias functions to meet complex process requirements.
Technical Specifications:
- Temperature Control Range: Room temperature to 600°C
Detailed content
- Control Mode: Multi‑zone independent closed‑loop PID control
- Temperature Uniformity: ±1°C within wafer effective process area
- Heating Element: High‑purity embedded resistance heating coil
- RF Compatibility: Supports RF bias coupling for plasma assisted processes
- Material: High‑purity ceramic surface, metal alloy base, high‑temperature insulation layer
- Sealing Structure: Metal seal / high‑temperature polymer seal compatible with vacuum environment
Key Features:
- Fast heating and cooling response speed, shortening process cycle time
- Excellent temperature uniformity to ensure consistent film thickness and etching rate
- High chemical inertness, resistant to fluorine, chlorine, oxygen and other process plasmas
- Integrated RF transmission path, reducing signal loss and interference
- Long service life, low maintenance rate, suitable for high‑volume manufacturing
Application Scenarios:
Applied to CVD, PECVD, ALD, etching and ion implantation processes in AMAT semiconductor platforms, especially for processes requiring strict thermal control such as gate dielectric deposition, interlayer dielectric film formation and shallow trench isolation etching.
