Digital guide
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AMAT 0010-42744
- Product Name: Electrostatic Chuck (ESC) Heater Assembly
- Product Description: A integrated resistive heater assembly embedded within an electrostatic chuck for precise wafer temperature control during semiconductor processing.
- Technical Specifications:
- Wattage: 1.2 kW, dual-zone independent control.
Detailed content
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- Voltage: 208V AC, 3-phase.
- Temperature Range: 50°C to 450°C.
- Uniformity: ±1.5°C across 200mm wafer surface.
- Material: Aluminum nitride (AlN) ceramic insulator with molybdenum heating elements.
- Functional Features:
- Provides rapid, uniform heating with fast thermal response.
- High dielectric strength compatible with electrostatic clamping (ESC) voltages.
- Excellent thermal conductivity for stable temperature regulation.
- Hermetically sealed to prevent outgassing in high vacuum.
- Application Scenarios: Used in PVD (Endura) and CVD (Centura) chambers for processes requiring tight temperature control, such as aluminum, copper, and barrier metal deposition.
