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AMAT 0010-38644
- Brand & Part Number: Applied Materials (AMAT) 0010-38644
- Product Name: Heated Gas Distribution Manifold
- Product Description: A precision-machined heated manifold for distributing process and carrier gases in semiconductor deposition systems. It maintains precise gas temperature to prevent condensation and ensure consistent flow characteristics.
Detailed content
- Technical Specifications:
- Material: Electropolished 316L stainless steel
- Number of Channels: 6 independent gas channels
- Heating Capacity: 50–200°C (precision controlled)
- Temperature Uniformity: ±1°C across all channels
- Pressure Rating: 0–250 PSI
- Fitting Type: 1/4″ VCR face-seal connections
- Leak Rate: ≤ 1×10⁻⁹ atm-cc/s He
- Functional Features:
- Integrated heating eliminates gas condensation
- Uniform temperature distribution across all channels
- Ultra-high purity design prevents contamination
- Individual channel isolation for maintenance flexibility
- Precision temperature control via integrated sensor
- Compact design for dense gas panel integration
- Applications:
- Heated gas distribution for CVD, ALD, and epitaxial processes
- Precisely temperature-controlled gas delivery in AMAT Centura systems
- Processes requiring temperature-stabilized precursor gas delivery
