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AMAT 0010-37390
Product Name: Advanced Process Chamber Cathode Assembly
Product Introduction: A high-performance cathode assembly designed for semiconductor plasma process chambers, optimized for stable and uniform plasma generation in etching applications.
Technical Specifications:
- Material: High-purity, plasma-resistant aluminum alloy
Detailed content
- Surface Treatment: Specialized anodization for enhanced plasma compatibility
- Electrode Geometry: Precision-machined for uniform plasma distribution
- RF Compatibility: Optimized for 13.56 MHz standard semiconductor RF frequencies
- Compatibility: AMAT Centura and DPS etch chamber platforms
Functional Features:
- Generates stable, uniform plasma for consistent wafer etching
- Resists plasma erosion and chemical corrosion for extended service life
- Minimizes particle contamination in ultra-clean process environments
- Ensures uniform RF power distribution across wafer surfaces
- Easy installation and replacement during chamber maintenance
Application Scenarios:
- Cathode assembly in semiconductor dry etch process chambers
- Plasma generation component for AMAT Centura DPS systems
- Replacement cathode for advanced semiconductor etching equipment
- Critical component for 200mm and 300mm wafer fabrication processes
