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AMAT 0010-30528
- Product Name: ESC (Electrostatic Chuck) RF Insert Assembly
- Product Description: A high-voltage RF feedthrough assembly integrated into an electrostatic chuck, providing RF power coupling while maintaining vacuum integrity and electrical isolation.
- Technical Specifications:
- Voltage Rating: 5 kV RF (13.56 MHz).
Detailed content
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- Dielectric Material: High-purity alumina (Al₂O₃) ceramic.
- Sealing: FFKM O-ring for UHV compatibility.
- Connection: N-type female RF coaxial port.
- Leak Rate: <1 x 10⁻⁹ atm-cc/sec He.
- Temperature Rating: -20°C to 200°C.
- Functional Features:
- Efficient RF power transmission to the wafer pedestal with minimal loss.
- Excellent electrical isolation between chamber ground and RF electrode.
- Resistant to plasma erosion and chemical attack.
- Ensures hermetic seal under high vacuum and temperature cycling.
- Precision-machined for exact fit and alignment.
- Application Scenarios: Used in RF-biased PVD and Etch chambers (Endura, Centura) where electrostatic clamping and RF plasma excitation are required.
